High tensile strength of sputter-deposited ZrB2 ceramic thin films measured up to 1016 K

Physical Properties of Reactively Sputter-Deposited C-N Thin Films

This work aims to prepare and study amorphous carbon nitride (CNx) films. Films were deposited by reactive magnetron radiofrequency (RF) sputtering from graphite target in argon and nitrogen mixture discharge at room temperature. The ratio of the gas flow rate was varied from 0.1 to 1. Deposited films were found to be amorphous. Highest Nitrogen concentration achieved was 42 atomic percent whic...

Metal-to-insulator transition in sputter deposited 3NiÕAl thin films

Growth, structure and stability of sputter-deposited MoS2 thin films

Molybdenum disulphide (MoS2) thin films have received increasing interest as device-active layers in low-dimensional electronics and also as novel catalysts in electrochemical processes such as the hydrogen evolution reaction (HER) in electrochemical water splitting. For both types of applications, industrially scalable fabrication methods with good control over the MoS2 film properties are cru...

Sputter-deposited Sma Thin Films: Properties and Applications

Shape memory alloy (SMA) thin films formed by sputter deposition have attracted considerable attention in the last decade. Current intensive research demonstrated that thin films' unique fine microstructure is responsible for superior shape memory characteristics in films, compared to that of bulk materials. Simultaneously, much effort has been taken in the development and fabrication of microd...

Enhanced methanol sensing performance of oblique deposited WO3 thin films

Methanol (CH3OH) is a colorless liquid with a mild odor. The wide ranges of applications, toxicity and clinical implications of methanol have made necessary to develop reliable and high-performance methanol sensors. In this paper, WO3 thin films were deposited on SiO2/Si substrates by e-beam evaporation technique under normal and oblique angles and then post-annealed at 500 °C with a flow of ox...